BOC Edwards Seiko Seiki STPH301C Mag
- 2300.00 £
- Published date: March 22, 2024
-
- Hereford, Herefordshire, United Kingdom
BOC Edwards Seiko Seiki STPH301C Mag
⭕ >108
H2
103
Ultimate pressure with bake out heating
10-7 Pa (10-9 Torr)
Maximum continuous outlet pressure
660 Pa (5 Torr)
Maximum Nitrogen throughput
2500 sccm
Rated speed
48000 rpm
Starting time
4 min
Maximum inlet flange temperature
120 °C
Input voltage
100 to 120 V a.c. (± 10) or
200 to 240 V a.c. (± 10)
Power consumption
0.6 kVA
Weight
Pump
15 kg
Technology
Edwards is a leader in clean and dry vacuum technology. The first STP pumps were sold in 1983 and there are now over 80000 installations worldwide. 85% are operating on semiconductor process tools where they demonstrate exceptional levels of reliability. STP pumps are the first choice for applications demanding high up-time, hydrocarbon-free pumping, minimal maintenance and low vibration.
Applications
Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
Electron cyclotron resonance (ECR) etch
Film deposition CVD, PECVD, ECRCVD, MOCVD
Sputtering
Ion implantation source, beam line pumping end station
MBE
Diffusion
Photo resist stripping
Crystal/epitaxial growth
Wafer inspection
Load lock chambers
Scientific instruments: surface analysis, mass spectrometry, electron microscopy
High energy physics: beam lines, accelerators
Radioactive applications: fusion systems, cyclotrons
H2
103
Ultimate pressure with bake out heating
10-7 Pa (10-9 Torr)
Maximum continuous outlet pressure
660 Pa (5 Torr)
Maximum Nitrogen throughput
2500 sccm
Rated speed
48000 rpm
Starting time
4 min
Maximum inlet flange temperature
120 °C
Input voltage
100 to 120 V a.c. (± 10) or
200 to 240 V a.c. (± 10)
Power consumption
0.6 kVA
Weight
Pump
15 kg
Technology
Edwards is a leader in clean and dry vacuum technology. The first STP pumps were sold in 1983 and there are now over 80000 installations worldwide. 85% are operating on semiconductor process tools where they demonstrate exceptional levels of reliability. STP pumps are the first choice for applications demanding high up-time, hydrocarbon-free pumping, minimal maintenance and low vibration.
Applications
Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
Electron cyclotron resonance (ECR) etch
Film deposition CVD, PECVD, ECRCVD, MOCVD
Sputtering
Ion implantation source, beam line pumping end station
MBE
Diffusion
Photo resist stripping
Crystal/epitaxial growth
Wafer inspection
Load lock chambers
Scientific instruments: surface analysis, mass spectrometry, electron microscopy
High energy physics: beam lines, accelerators
Radioactive applications: fusion systems, cyclotrons
Phone number ✆ 07918 182133
Hereford, Herefordshire
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